Title of article
Low-temperature PECVD-deposited silicon nitride thin films for sensor applications
Author/Authors
Suchaneck، نويسنده , , G. and Norkus، نويسنده , , V. and Gerlach، نويسنده , , G.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
5
From page
808
To page
812
Abstract
Polymer-like silicon-rich SiNx:H films suitable for transparent VIS/NIR/MIR-range optical coatings were deposited by PECVD at a substrate temperature of 80 and 150°C. Optical properties and film microstructure were investigated by transmission/reflection measurements and by FTIR. Air exposure for more than 1 year reveals no post-oxidation with time. The application as an antireflective coating for IR-sensor arrays is demonstrated.
Keywords
Silicon-rich silicon nitride , Plasma-enhanced CVD , Low temperature deposition
Journal title
Surface and Coatings Technology
Serial Year
2001
Journal title
Surface and Coatings Technology
Record number
1802313
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