Title of article
In situ film diagnostics during plasma polymerisation using waveguide mode spectroscopy
Author/Authors
Jacobsen، نويسنده , , V. and Menges، نويسنده , , B. and Scheller، نويسنده , , A. and Fِrch، نويسنده , , R. and Mittler، نويسنده , , Mلrio S. and Knoll، نويسنده , , W.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
4
From page
1105
To page
1108
Abstract
An in situ determination of the optical properties of films deposited during plasma polymerisation processes with nanometer accuracy has been realised using waveguide mode spectroscopy. The detection method relies on a bi-diffractive grating coupler with two grating constants and allows the background free detection of the propagation constants in a reflected mode geometry. It enables separate determination of the refractive index (n) and the thickness (d) as the plasma polymer film grows. The method has been applied in a preliminary study of the plasma assisted deposition mechanism of allylamine and maleic anhydride.
Keywords
plasma polymerization , Waveguide mode spectroscopy , Refractive index , In situ characterization , Thin films
Journal title
Surface and Coatings Technology
Serial Year
2001
Journal title
Surface and Coatings Technology
Record number
1802474
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