Title of article
Atmospheric pressure chemical vapour deposition of polycarbosilane films via UV laser-induced polymerization of ethynyltrimethylsilane
Author/Authors
Pola، نويسنده , , J. and Bastl، نويسنده , , Z. and Ouchi، نويسنده , , A. and ?ubrt، نويسنده , , J. and Morita، نويسنده , , H.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2002
Pages
6
From page
129
To page
134
Abstract
ArF laser-induced polymerization of gaseous ethynyltrimethylsilane at atmospheric pressure of He represents a convenient way of efficient chemical vapour deposition of polycarbosilane films. The films are produced at ambient temperature of metals, quartz and glass, and are adhesive to these substrates, which makes this process promising for fabrication of protective coatings on thermally unstable surfaces.
Keywords
Polycarbosilane films , Laser , Ethynyltrimethylsilane , chemical vapour deposition
Journal title
Surface and Coatings Technology
Serial Year
2002
Journal title
Surface and Coatings Technology
Record number
1802995
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