• Title of article

    Stress profiles and thermal stability of CrxNy films deposited by magnetron sputtering

  • Author/Authors

    Djouadi، نويسنده , , M.-A. and Nouveau، نويسنده , , C. and Banakh، نويسنده , , O. and Sanjinés، نويسنده , , R. and Lévy، نويسنده , , F. and Nouet، نويسنده , , G.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2002
  • Pages
    5
  • From page
    510
  • To page
    514
  • Abstract
    CrN and Cr2N coatings were synthesized by magnetron sputtering. The limiting factors for the application of these coatings for protecting cutting tools are their lack of adhesion and thermal stability. Therefore, a study of these two parameters has been conducted. First, the influence of the film thickness on the compressive stress and also on the mechanical and structural properties of the films were studied. The results showed that for both phases the stress is not homogeneous with the film thickness. Second, the thermal stability was investigated by post deposition annealing in nitrogen. It reveals that CrN and Cr2N films are stable when heated at temperatures up to 1000 K.
  • Keywords
    thermal stability , Chromium nitride , Stress profiles
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2002
  • Journal title
    Surface and Coatings Technology
  • Record number

    1803454