Plasma diagnostics by detecting the ion flux profile to a biased-target

A new method for reactive plasma diagnostics is established. It is based on the electrostatic lens effect of the sheath evolving to a one-side biased-target that focuses charged particles to distinct regions of the surface. Thus, developing the ion sputtering profile one can obtain information about sheath thickness, negative ion density, and dust content. The applicability of the method is tested in electropositive and electronegative plasmas of Ar, O2 and Ar/SF6 gases.