Title of article
Recent development in a TEM specimen preparation technique using FIB for semiconductor devices
Author/Authors
Nakahara، نويسنده , , Shohei، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
7
From page
721
To page
727
Abstract
A brief overview of the transmission electron microscope (TEM) operation in the semiconductor industry is given. A recent emergence of a focused ion-beam (FIB) machine as a dedicated TEM specimen preparation tool has changed the role of TEM in the semiconductor industry dramatically. Advantages and disadvantages of TEM specimens prepared by a FIB machine are discussed together with damage produced by high-energy ion beams.
Keywords
Semiconductor , Focused ion-beam , TEM
Journal title
Surface and Coatings Technology
Serial Year
2003
Journal title
Surface and Coatings Technology
Record number
1805905
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