• Title of article

    Characterisations of atmospheric pressure ejected plasma sources

  • Author/Authors

    Kim، نويسنده , , Yong-Hwan and Choi، نويسنده , , Yoon Ho and Kim، نويسنده , , Ji-Hun and Park، نويسنده , , Jongkyu and Ju، نويسنده , , Won-Tae and Paek، نويسنده , , Kwang-Hyun and Hwang، نويسنده , , Yong-Seok، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2003
  • Pages
    6
  • From page
    535
  • To page
    540
  • Abstract
    Atmospheric pressure ejected plasma sources have been developed for processing arbitrary shaped objects. Plasma sources with two coaxial electrodes are characterised experimentally by varying source design parameters such as discharge volume and discharge gap distance under various operating conditions such as RF power, gas flow rate, and gas compositions. Using optical emission spectroscopy (OES), gas temperatures and radical densities are qualitatively evaluated for flexible applications of the source. Discharge characteristics as glow has been confirmed with voltage and current (V–I) probes. Based on these source characteristics, specific design rules are presented for various applications such as polymer surface modification and metal surface decontamination.
  • Keywords
    Radical density , Atmospheric pressure ejected plasma , Gas temperature , OES
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2003
  • Journal title
    Surface and Coatings Technology
  • Record number

    1806540