Title of article
Characterisations of atmospheric pressure ejected plasma sources
Author/Authors
Kim، نويسنده , , Yong-Hwan and Choi، نويسنده , , Yoon Ho and Kim، نويسنده , , Ji-Hun and Park، نويسنده , , Jongkyu and Ju، نويسنده , , Won-Tae and Paek، نويسنده , , Kwang-Hyun and Hwang، نويسنده , , Yong-Seok، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
6
From page
535
To page
540
Abstract
Atmospheric pressure ejected plasma sources have been developed for processing arbitrary shaped objects. Plasma sources with two coaxial electrodes are characterised experimentally by varying source design parameters such as discharge volume and discharge gap distance under various operating conditions such as RF power, gas flow rate, and gas compositions. Using optical emission spectroscopy (OES), gas temperatures and radical densities are qualitatively evaluated for flexible applications of the source. Discharge characteristics as glow has been confirmed with voltage and current (V–I) probes. Based on these source characteristics, specific design rules are presented for various applications such as polymer surface modification and metal surface decontamination.
Keywords
Radical density , Atmospheric pressure ejected plasma , Gas temperature , OES
Journal title
Surface and Coatings Technology
Serial Year
2003
Journal title
Surface and Coatings Technology
Record number
1806540
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