Title of article
Spectroscopic investigations on silicon nitride deposition with the Plasmodul®
Author/Authors
Schulz، نويسنده , , A. and Feichtinger، نويسنده , , J. and Krüger، نويسنده , , J. and Walker، نويسنده , , M. and Schumacher، نويسنده , , U.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
5
From page
947
To page
951
Abstract
Investigations by emission light spectroscopy and mass spectrometry at gas mixture variations between the plasma compounds H2, N2, NH3 and SiH4 are presented to get information about the processes taking place in a silicon nitride deposition with the Plasmodul® out of the monomers NH3 and SiH4. The Plasmodul® is a microwave sustained low pressure plasma reactor with a modular concept based on the Duo-Plasmaline® principle which provides an easy upscaling for industrial applications.
Keywords
mass spectrometry , plasma reactor , Silicon nitride
Journal title
Surface and Coatings Technology
Serial Year
2003
Journal title
Surface and Coatings Technology
Record number
1806748
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