Title of article
Study of plasma processes during pulsed laser ablation of graphite target in nitrogen
Author/Authors
Bul?́?، نويسنده , , William J. and Novotny، نويسنده , , M. and Jel?́nek، نويسنده , , M. and Jastrab?́k، نويسنده , , L. and Zelinger، نويسنده , , Z.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
5
From page
968
To page
972
Abstract
Plasma processes during CNx films deposition were studied in a pulsed laser deposition system equipped with a KrF excimer laser (500 mJ, 20 ns). The laser plasma was characterized in a pressure range from 2 to 100 Pa of nitrogen gas. We report on an optical emission spectroscopy, which was used for a spatial and time resolved investigation of the plasma species. Analysis includes estimation of vibrational and rotational temperatures of the CN molecule.
Keywords
Laser deposition , Emission spectroscopy , Plasma processes
Journal title
Surface and Coatings Technology
Serial Year
2003
Journal title
Surface and Coatings Technology
Record number
1806758
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