• Title of article

    Study of plasma processes during pulsed laser ablation of graphite target in nitrogen

  • Author/Authors

    Bul?́?، نويسنده , , William J. and Novotny، نويسنده , , M. and Jel?́nek، نويسنده , , M. and Jastrab?́k، نويسنده , , L. and Zelinger، نويسنده , , Z.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2003
  • Pages
    5
  • From page
    968
  • To page
    972
  • Abstract
    Plasma processes during CNx films deposition were studied in a pulsed laser deposition system equipped with a KrF excimer laser (500 mJ, 20 ns). The laser plasma was characterized in a pressure range from 2 to 100 Pa of nitrogen gas. We report on an optical emission spectroscopy, which was used for a spatial and time resolved investigation of the plasma species. Analysis includes estimation of vibrational and rotational temperatures of the CN molecule.
  • Keywords
    Laser deposition , Emission spectroscopy , Plasma processes
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2003
  • Journal title
    Surface and Coatings Technology
  • Record number

    1806758