Title of article
Ionization enhancement of zirconium atoms in inductively coupled discharge
Author/Authors
Nakamura، نويسنده , , Keiji and Yoshinaga، نويسنده , , Hiroaki and Yukimura، نويسنده , , Ken، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
4
From page
188
To page
191
Abstract
This paper reports on ionization of sputtered zirconium (Zr) atoms in inductively coupled argon discharge. A Zr+ ion flux fraction to overall Zr species mainly was obtained by deposition measurements with the retarding bias method, and the fraction approximately reached ∼100%. The Zr+ ion fraction was affected by the discharge pressure, and hardly dependent on the discharge power corresponding to an electron density. This result suggested that the Zr+ ions were generated with ionization process other than electron impact such as Penning effect. There was an optimal pressure to produce the Zr+ ions, and the Zr+ ion density estimated from the deposition measurement was consistent with that obtained from a combination of Langmuir probe measurements and mass spectroscopic measurements.
Keywords
Zirconium ion , Ion flux fraction , sputtering , Inductively coupled discharge
Journal title
Surface and Coatings Technology
Serial Year
2005
Journal title
Surface and Coatings Technology
Record number
1809572
Link To Document