• Title of article

    Ionization enhancement of zirconium atoms in inductively coupled discharge

  • Author/Authors

    Nakamura، نويسنده , , Keiji and Yoshinaga، نويسنده , , Hiroaki and Yukimura، نويسنده , , Ken، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2005
  • Pages
    4
  • From page
    188
  • To page
    191
  • Abstract
    This paper reports on ionization of sputtered zirconium (Zr) atoms in inductively coupled argon discharge. A Zr+ ion flux fraction to overall Zr species mainly was obtained by deposition measurements with the retarding bias method, and the fraction approximately reached ∼100%. The Zr+ ion fraction was affected by the discharge pressure, and hardly dependent on the discharge power corresponding to an electron density. This result suggested that the Zr+ ions were generated with ionization process other than electron impact such as Penning effect. There was an optimal pressure to produce the Zr+ ions, and the Zr+ ion density estimated from the deposition measurement was consistent with that obtained from a combination of Langmuir probe measurements and mass spectroscopic measurements.
  • Keywords
    Zirconium ion , Ion flux fraction , sputtering , Inductively coupled discharge
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2005
  • Journal title
    Surface and Coatings Technology
  • Record number

    1809572