Title of article
Challenges of producing TiO2 films by microwave heating
Author/Authors
Hart، نويسنده , , J.N and Cheng، نويسنده , , Y.-B. and Simon، نويسنده , , G.P. and Spiccia، نويسنده , , L.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
4
From page
20
To page
23
Abstract
Microwave processing is an attractive alternative to conventional furnace treatment for sintering of TiO2 nanostructured thin films. When heated with 2.45-GHz microwaves, it was found that conducting glass cracked when a temperature above ∼200 °C was reached. Coating a ∼20-μm-thick film of nanostructured TiO2 on the transparent conducting oxide (TCO) glass (using a commercially available powder) raised the temperature at which cracking occurred to ∼400 °C. When a sol–gel method was used to produce TiO2, difficulties were encountered in the production of ∼10-μm-thick films, including cracking of films during drying.
Keywords
Nanostructure , Sol–gel , Titanium oxide , microwave
Journal title
Surface and Coatings Technology
Serial Year
2005
Journal title
Surface and Coatings Technology
Record number
1809734
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