Development of PE-CVD Si/C/N:H films for tribological and corrosive complex-load conditions

Amorphous Si/C/N:H where synthesized by plasma enhanced chemical vapor deposition (PE-CVD) using the single-source precursors hexamethyldisilazane (HMDS) and bis(trimethylsilyl)carbodiimide (BTSC). The films produced using the HMDS precursor were rich in carbon, while the films synthesized from the BTSC precursor were high in nitrogen content. All films were amorphous and exhibited a similar hardness to SiC or Si3N4. ental properties of the films were determined in tests such as ultra micro-hardness, elastic modulus, thickness and adhesion. To investigate the composition of the films, composition depth profiles were determined by GDOES. ar behaviour was studied in sliding tests under oscillating motion. To investigate the wear mechanisms, the wear tracks were examined with topographical analysis, REM as well as EDX.