DC thermal plasma CVD synthesis of coatings from liquid single source SiBCN and SiCNTi precursors

DC plasma jet CVD is applied to synthesize coatings from liquid state single source precursors on metallic substrates. For SiBCN coating synthesis hexamethylcyclotrisilazanoboranes with Si/B ratio 3:1, 3:2 and 3:3 are used. SiCNTi coatings are produced with tris(dimethylamino)- and tris(diethylamino)hexamethylcyclotrisilazanotitanium. Attempts to deposit SiCNZr coatings by use of tris(diethylamino)hexamethylcyclotrisilazanozironium are not successful due to too high precursor viscosity. Vacuum plasma sprayed nickel, molybdenum and copper interlayers prove to permit effective suppression of nitride and boride reaction zone formation, which is observed during direct SiBCN coating deposition on mild steel substrates. By use of adapted process parameters coatings with columnar or dense morphology and amorphous or nanocrystalline structure can be synthesized. Deposition rates exceeding 2000 μm/h are achieved. By relative movement between DC plasma torch and substrate surface the coated area is enlarged. Simultaneous improvement of coating density and homogeneity is observed.