Title of article
Mechanical properties of boron nitride films prepared by plasma-enhanced chemical vapor deposition
Author/Authors
Yang، نويسنده , , Hangsheng and Yoshida، نويسنده , , Toyonobu، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
4
From page
984
To page
987
Abstract
Two kinds of boron nitride thin films, cubic boron nitride film with a layered structure, and turbostratic boron nitride film with a c-axis parallel to the substrate surface, were prepared by inductively coupled plasma-enhanced chemical vapor deposition. Nanoindentation tests revealed that the hardness and elastic modulus of cubic boron nitride films increased with cubic phase content and approached approximately 50 and 250 GPa, respectively, for the case of 96% cubic phase, while those of turbostratic boron nitride films were load and loading rate dependent and as low as 1.5 and 30 GPa, respectively. Moreover, the hysteretic recovery of turbostratic boron nitride after indentation was confirmed, and approximately 50% of the energy dissipated during indentation was found to be released within 1 min.
Keywords
Cubic boron nitride , ICP-CVD , Turbostratic boron nitride , Nanoindentation , Hardness , Recovery
Journal title
Surface and Coatings Technology
Serial Year
2005
Journal title
Surface and Coatings Technology
Record number
1810306
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