Title of article
Structure and mechanical properties of ZrCrAlN nanostructured thin films by closed-field unbalanced magnetron sputtering
Author/Authors
Kim، نويسنده , , Youn J. and Lee، نويسنده , , Ho Y. and Kim، نويسنده , , Yong M. and Shin، نويسنده , , Kyung S. and Jung، نويسنده , , Woo S. and Han، نويسنده , , Jeon G.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2007
Pages
5
From page
5547
To page
5551
Abstract
Quaternary ZrCrAlN nanostructured thin films were synthesized by Closed-Field Unbalanced Magnetron Sputtering, and their microstructure and mechanical properties of the ZrCrAlN nanostructured thin films were examined. The grain refinement of the ZrCrAlN nanostructured thin films was controlled by adjusting the N2 partial pressure. The hardness of the film varied with the N2 partial pressure and the maximum value was approximately 45 GPa. It was also confirmed that there is a critical value of the grain size, dc, needed to maximize the hardness.
Keywords
ZrCrAlN , Nanostructured , CFUBMS
Journal title
Surface and Coatings Technology
Serial Year
2007
Journal title
Surface and Coatings Technology
Record number
1815778
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