• Title of article

    Interfacial characteristic of graded hydroxyapatite and titanium thin film by magnetron sputtering

  • Author/Authors

    Chen، نويسنده , , Minfang and Liu، نويسنده , , Debao and You، نويسنده , , Chen and Yang، نويسنده , , Xianjin and Cui، نويسنده , , Zhenduo، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2007
  • Pages
    4
  • From page
    5688
  • To page
    5691
  • Abstract
    Graded film of calcium phosphate and titanium (Ti) was prepared on Ti-6Al-4V alloy by radio-frequency magnetron sputtering. Concurrent sputtering of HA and Ti for four times, The area proportions of HA to Ti in the targets are 20%, 50%, 90% and 100% respectively, contributes a gradual distribution of Ca, P, O and Ti across the interface of film and alloy substrate. The graded HA/Ti film is formed by annealing for 1 h at 600 °C water vapour flow. The tensile adhesion strength of graded sputtered and annealed HA/Ti film is approximately 35 Mpa, which is an obvious advantage compared with monolithic HA film. The results obtained from the nanoindentation test show that Youngʹs modulus and microhardness of graded HA/Ti film are also graded distribution and strain reversion was much better than that in the monolithic HA film.
  • Keywords
    Graded thin film , Magnetron sputter , Hydroxyapatite , adhesion strength
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2007
  • Journal title
    Surface and Coatings Technology
  • Record number

    1815883