Title of article
Interfacial characteristic of graded hydroxyapatite and titanium thin film by magnetron sputtering
Author/Authors
Chen، نويسنده , , Minfang and Liu، نويسنده , , Debao and You، نويسنده , , Chen and Yang، نويسنده , , Xianjin and Cui، نويسنده , , Zhenduo، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2007
Pages
4
From page
5688
To page
5691
Abstract
Graded film of calcium phosphate and titanium (Ti) was prepared on Ti-6Al-4V alloy by radio-frequency magnetron sputtering. Concurrent sputtering of HA and Ti for four times, The area proportions of HA to Ti in the targets are 20%, 50%, 90% and 100% respectively, contributes a gradual distribution of Ca, P, O and Ti across the interface of film and alloy substrate. The graded HA/Ti film is formed by annealing for 1 h at 600 °C water vapour flow. The tensile adhesion strength of graded sputtered and annealed HA/Ti film is approximately 35 Mpa, which is an obvious advantage compared with monolithic HA film. The results obtained from the nanoindentation test show that Youngʹs modulus and microhardness of graded HA/Ti film are also graded distribution and strain reversion was much better than that in the monolithic HA film.
Keywords
Graded thin film , Magnetron sputter , Hydroxyapatite , adhesion strength
Journal title
Surface and Coatings Technology
Serial Year
2007
Journal title
Surface and Coatings Technology
Record number
1815883
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