Title of article
A device for trapping nano-particles formed in processing plasmas for reduction of nano-waste
Author/Authors
Iwashita، نويسنده , , Shinya and Koga، نويسنده , , Kazunori and Shiratani، نويسنده , , Masaharu، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2007
Pages
4
From page
5701
To page
5704
Abstract
Removal of nano-particles is important from the viewpoint that nano-materials may be hazardous to health when they deposit within the respiratory system. We have developed a method for measuring a sticking probability of nano-particles to a wall. The probability of nano-particles above 2 nm in size to a stainless-steel wall is close to 100% at a low ambient pressure below about 160 Pa. Based on this result, we have developed a device for trapping nano-particles formed in low pressure processing plasmas in order to reduce nano-waste, that is, waste of nm in size. The device traps nano-particles by collision and attachment of nano-particles to its surface. The trapping efficiency of the device for nano-particles above 2 nm in size is more than 99.8% at a low ambient pressure below about 160 Pa.
Keywords
Environment , sticking probability , Nano-particle , Plasma process
Journal title
Surface and Coatings Technology
Serial Year
2007
Journal title
Surface and Coatings Technology
Record number
1815889
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