Development of a novel cathodic plasma/electrolytic deposition technique part 1: Production of titanium dioxide coatings

A new atmospheric pressure plasma electrolytic deposition process has been developed for the production of crystalline titanium dioxide films on metal substrates. The process occurs in a liquid precursor composed of titanium tetraisopropoxide and absolute ethanol. A plasma discharge is created and confined around the cathode in a superheated vapour sheath surrounded by the liquid phase, inducing the production of a nano-crystalline TiO2 coating at the surface of the cathode. The analysis of the structure and composition of these TiO2 coatings have been carried out by Scanning Electron Microscopy, Transmission Electron Microscopy, Raman and X-Ray Photoelectron Spectroscopies and X-Ray Diffraction. The produced crystalline titanium dioxide coatings are very adherent to the substrate and present a dendritic-like structure. We have moreover demonstrated that it is possible to adjust easily its composition by a post-processing calcination. Such characteristics make these films very interesting for photocatalysis, solar cells and gas sensing applications, and promise therefore some useful industrial benefits.