Title of article
Temperature behavior of atmospheric-pressure non-equilibrium microwave discharge plasma jets for poly(ethylene naptharate)-surface processing
Author/Authors
Yuji، نويسنده , , Toshifumi and Urayama، نويسنده , , Takuya and Fujii، نويسنده , , Shuitsu and Mungkung، نويسنده , , Narong and Akatsuka، نويسنده , , Hiroshi، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
4
From page
5289
To page
5292
Abstract
To understand the mechanism of surface processing using an atmospheric-pressure non-equilibrium microwave discharge plasma jet, we used optical emission spectroscopy to measure the vibrational and rotational temperatures of plasma. A microwave (2.45 GHz) power supply was used to excite the plasma. The vibrational and rotational temperatures in the plasma were measured at approximately 0.18 eV and 0.22 eV. We also conducted plasma surface processing of polyethylene naphthalate (PEN) film to measure changes in the water contact angle before and after the PEN film was processed, as well as while the rotational temperature of the plasma increased. The hydrophilicity of the PEN film surface was found to improve as the rotational temperature of the plasma increased.
Keywords
Microwave discharge plasma jet , optical emission spectroscopy , Rotational temperature , Vibrational temperature , PEN film
Journal title
Surface and Coatings Technology
Serial Year
2008
Journal title
Surface and Coatings Technology
Record number
1819443
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