Structural analysis of monolayered and bilayered SnO2 thin films

Mono- and bilayered undoped and fluorine doped SnO2 thin films have been successfully prepared at optimized postdeposition temperatures of 590 and 610 °C by the atmospheric pressure chemical vapor deposition method. The microstructural properties of as-deposited films were thoroughly examined using the Rietveld refinement of powder-like XRD patterns, while the film surface has been probed using atomic field microscopy. The structural parameters were correlated to the deposition parameters and interesting findings were revealed. Finally, the specific electrical resistivity of the thin films has been measured and correlated with the optical transmittance.