HiPIMS deposition of TiOx in an industrial-scale apparatus: Effects of target size and deposition geometry on hysteresis

High power impulse magnetron sputtering (HiPIMS) has proven its potential for improvement of properties of deposited coatings. Yet, up-scaling of processes into large industrial-scale systems needs investigation. Hereby we report reactive HiPIMS of titanium dioxide thin films carried out in a cubic meter large deposition chamber using a 30.5 × 12.5 cm2 titanium target sputtered in Ar/O2 gas atmosphere. The effect of the pulsing frequency at constant average power (2 kW) has been studied. A significant reduction of hysteresis was observed for pulsing frequencies as low as 200 Hz, confirming previous studies. Finally, data from X-ray diffraction indicate that the phase constitution of the HiPIMS-deposited coatings evolves from an anatase/rutile mixture to rutile as the pulse frequency is decreased.