• Title of article

    The properties of molybdenum nitride coatings obtained by cathodic arc evaporation

  • Author/Authors

    Gilewicz، نويسنده , , A. and Warcholinski، نويسنده , , B. and Murzynski، نويسنده , , D.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2013
  • Pages
    10
  • From page
    149
  • To page
    158
  • Abstract
    Among the many techniques for the deposition of Mo–N coatings, AC and DC magnetron sputtering, ion implantation and cathodic arc evaporation, the latter is the most comprehensive, owing to the high degree of particle ionisation in the plasma, high density and coating quality. The phase structure of Mo–N coatings strongly depends on the deposition technology, mainly on the pressure of nitrogen in the working chamber, and the substrate bias voltage. Coatings deposited at four nitrogen pressures: 0.6, 1.0, 1.8 and 3.0 Pa, and four negative substrate bias voltages UB: 10, 70, 150 and 250 V, were widely tested. EDS and WDS were used to evaluate the chemical composition, XRD to determine the phase composition, scanning and an optical microscopy to assess the morphology and surface quality, the scratch test and Daimler-Benz test to estimate the coatings adhesion, and ball-on-disc test to define the specific wear rate. crease in the nitrogen pressure changes the phase structure of the body-centred cubic lattice of molybdenum Mo, through cubic γ-Mo2N to the hexagonal δ-MoN. Due to the different structures of the crystal lattice, the given phases exhibit different physical properties. The substrate bias voltage rise initiates the resputtering of the coating, causing a reduction in nitrogen atoms in the coating. This affects the changes in the chemical composition and the coating morphology. It can be the cause of the cubic γ-Mo2N phase existing in the deposition conditions of the hexagonal δ-MoN phase. latively large amount of macroparticles on the coating surface depends on the nitrogen pressure and the substrate bias voltage. The surface roughness Ra of the coating deposited at substrate bias voltages of more than − 70 V is relatively small and almost independent of the nitrogen pressure. The coatings deposited at low substrate bias voltages (UB = − 10 V) are characterised by more than twice the surface roughness Ra, decreasing as the partial pressure of nitrogen increases. chanical parameters of the deposited coatings depend on their phase composition due to the different properties of Mo, Mo2N and MoN.
  • Keywords
    Cathodic arc evaporation , MoN phases , Surface roughness , Substrate bias voltage , Adhesion , WEAR
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2013
  • Journal title
    Surface and Coatings Technology
  • Record number

    1829525