Oxygen atom kinetics in silane–hydrogen–nitrous oxide mixtures behind reflected shock waves

Resonance Absorption Spectroscopy has been used to study the O-atom dynamics behind reflected shock waves in highly argon diluted silane–hydrogen–nitrous oxide mixtures in the temperature range 1606–2528 K and at total pressures from 234 to 584 kPa. The absorptions at 130.5 nm of N2O, SiH4 and Si have been taken into account to compare simulated and experimental absorption profiles. A detailed kinetic model has been also used to interpret the results and reaction pathway and sensitivity analyses have been performed to underline important elementary reactions. A comparison with the O-atom kinetic in silane–nitrous oxide and hydrogen–nitrous oxide mixtures is also proposed.