Title of article
Growth optimisation of high quality graphene from ethene at low temperatures
Author/Authors
Wirtz، نويسنده , , Christian C. Lee، نويسنده , , Kangho and Hallam، نويسنده , , Toby and Duesberg، نويسنده , , Georg S.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2014
Pages
5
From page
192
To page
196
Abstract
Large-area, high-quality graphene was grown via thermal chemical vapour deposition from ethene on Cu substrates at 850 °C. The quality of the graphene was assessed using Raman spectroscopy, SEM and electrical characterisation. The Raman spectroscopy yielded excellent results with an average 2D/G ratio of ∼2.75 and 2D FWHM of ∼35 cm−1 in the flake centres, indicative of single layer growth. Graphene field effect transistors were fabricated from in situ grown graphene lines, displaying mobilities of 1100 cm2 V−1 s−1 and 700 cm2 V−1 s−1 at room temperature for holes and electrons, respectively, underlining the high quality of the graphene.
Journal title
Chemical Physics Letters
Serial Year
2014
Journal title
Chemical Physics Letters
Record number
1936332
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