The investigation of the contrast of X-ray masks repaired by laser-induced CVD

Rhenium, gold and platinum film micropatterns were deposited by a pulse nitrogen laser (λ = 337 nm) on a surface of a silicon membrane from vapors of Re2(CO)10, (CH3)2Au(dpm), and Pt(hfac)2, respectively. The high marginal sharpness and the thickness uniformity of the deposited films was provided by the use of a powerful nanosecond pulse laser, a projective system for delineation of the irradiation zone and laser beam microscanning at the limits of this zone. The scheme of the set for direct laser deposition of film micropatterns was presented. It was shown that X-ray masks with golden patterns on silicon membranes may be repaired by laser-induced chemical vapor deposition (LCVD). The contrasts of deposited Au, Re and Pt films correspond to calculated contrasts.