High performance field-emission column for next generation E-Beam Tester

Electron beam testing is a state-of-the-art method for design verification and failure analysis of highly integrated devices. The progressive development in IC complexity and performance, however, is forcing a rapid evolution in electron beam testing technology. The instrumentation required for the next generation of devices must be capable of probing lines with geometries under half a micrometer with GHz signals applied. In accordance with these needs, a new E-Beam Tester has been developed. By applying field emission technology to electron probe generation, a remarkable increase in performance has been obtained by comparison with conventional systems. An extremely high beam current is focused to a probe of 50 nm diameter. With this precise signal measurements with 10 GHz bandwidth can be performed, such as delay measurements with a time resolution of better than 10 ps. The measurement voltage accuracy of low amplitude signals in the mV-range also benefits from the improved probe performance.