Title of article
Microstrip gas chambers on implanted substrates
Author/Authors
Pallarès، نويسنده , , A and Barthe، نويسنده , , S and Bergtold، نويسنده , , A.M and Brom، نويسنده , , J.M and Cailleret، نويسنده , , J and Christophel، نويسنده , , E and Coffin، نويسنده , , J and Eberlé، نويسنده , , H and Fang، نويسنده , , R and Fontaine، نويسنده , , J.C and Geist، نويسنده , , Th Kachelhoffer، نويسنده , , T and Levy، نويسنده , , J.M and Mack، نويسنده , , V and Schunck، نويسنده , , J.P and Sigward، نويسنده , , M.H، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1995
Pages
4
From page
185
To page
188
Abstract
We have studied the performance of several Microstrip Gas Chamber (MSGC) prototypes made on standard Desag D263 boron implanted glass. The purpose of the implantation is to reduce the surface resistance. The long term stability of this implantation has been measured under applied bias voltage. Comparative tests have been carried out on prototypes made on implanted and unimplanted detectors under electron (90Sr) and X-ray (8 keV) irradiation. The total dose was approximately 7 mC/cm.
Journal title
Nuclear Instruments and Methods in Physics Research Section A
Serial Year
1995
Journal title
Nuclear Instruments and Methods in Physics Research Section A
Record number
1996317
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