Title of article
Heat load problems in deep X-ray lithography
Author/Authors
Cudin، نويسنده , , I. and De Bona، نويسنده , , F. and Gambitta، نويسنده , , A. and Pérennès، نويسنده , , F. and Turchet، نويسنده , , A.، نويسنده ,
Pages
4
From page
1265
To page
1268
Abstract
A 3D mathematical model of a complete Deep X-Ray Lithography scanning unit based on the Finite Element Method (FEM) was developed to analyse the replication errors induced by the thermoelastic deformations occurring under irradiation. Different thermal and mechanical constraint conditions were considered in order to evaluate the maximum displacements of the irradiated mask area. The obtained results show that, to evaluate the replication errors, the support ring and its mechanical fittings have to be carefully considered in the model. It is observed that the absolute position error and the blur error and the error induced by the thermal expansion of the mask are both position dependent.
Keywords
Deep X-Ray lithography , X-ray mask , Thermoelasticity , FEM , Transient analysis
Journal title
Astroparticle Physics
Record number
2016855
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