The structure study of boron carbonitride films obtained by use of trimethylamine borane complex

Diffraction of synchrotron radiation (SR) was used to investigate crystalline structure and phase composition of thin films (1500–5000 Å) of boron carbonitride. These films were synthesized by plasma-enhanced chemical vapor deposition using nontraditional volatile single source precursor trimethylamine borane complex (CH3)3N·BH3 and its mixture with ammonia. The effect of the gas ratio and substrate temperature on chemical and phase composition as well as the structure of the films were investigated. The XRD peculiarities of texture films and ways of increasing sensibility of measurements were considered. A possibility of the information density rise of the thin film XRD was shown due to application of different methods for recording diffraction patterns.