Title of article
Manufacturing of XEUV mirrors with a sub-nanometer surface shape accuracy
Author/Authors
Chkhalo، نويسنده , , N.I. and Kluenkov، نويسنده , , E.B. and Pestov، نويسنده , , A.E. and Polkovnikov، نويسنده , , V.N. and Raskin، نويسنده , , D.G. and Salashchenko، نويسنده , , N.N. and Suslov، نويسنده , , L.A. and Toropov، نويسنده , , M.N.، نويسنده ,
Pages
4
From page
62
To page
65
Abstract
In this paper, first results of finishing EUV mirror substrate surface shape to given parameters using correction methods such as vacuum thin films deposition and local ion-beam etching through the mask are presented. For spherical mirror substrate with radius of curvature R=260 mm and a diameter of 130 mm, obtained values of PV=4.7 nm and RMS=0.6 nm.
Keywords
Ion etching , EUV lithography , Multilayer mirrors , Roughness
Journal title
Astroparticle Physics
Record number
2026207
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