• Title of article

    Spatial uniformity of electron charge transport in high resistivity CdTe

  • Author/Authors

    Davies، نويسنده , , A.W. and Lohstroh، نويسنده , , A. and ضzsan، نويسنده , , M.E. and Sellin، نويسنده , , P.J.، نويسنده ,

  • Pages
    8
  • From page
    192
  • To page
    199
  • Abstract
    Electron charge transport in high resistivity CdTe was investigated in terms of drift mobility, charge collection efficiency, and mobility-lifetime product. CdTe devices were produced from material grown by the Travelling Heater Method. Infrared microscopy was used to assess the quality of CdTe wafers, which showed a concentration of bulk defects and tellurium precipitates around the edges of the wafers. Laser-induced time of flight was used to measure the electron drift velocity, which was linear with respect to electric field at field strengths up to 200 V/cm. The measured electron drift mobility was 1040±20 cm2/V s. Ion-beam induced charge (IBIC) imaging of the device cathode was carried out to produce high resolution maps of signal amplitude and electron drift time. Excellent spatial uniformity was observed in the sample, and a value of 6×10−3 cm2/V was measured for the electron mobility-lifetime product.
  • Keywords
    Cadmium telluride , Time of flight , Ion-beam induced charge imaging
  • Journal title
    Astroparticle Physics
  • Record number

    2026928