Title of article
A new evaporator system for target preparation at Argonne National Laboratory
Author/Authors
Greene، نويسنده , , John P. and Neubauer، نويسنده , , Janelle and Deligiannis، نويسنده , , Dino، نويسنده ,
Pages
4
From page
58
To page
61
Abstract
As part of an equipment grant provided by DOE for an upgrade to the target laboratory, the procurement of a new, general purpose, high-vacuum deposition system necessary to insure reliable and continued availability of high-purity targets was recognized as a priority item. Recommended specifications for this system included an automated, high-vacuum pumping station, a deposition chamber capable of handling large area foils or installation of a substrate planetary system for uniform coating capabilities and incorporating state-of-the-art thin film technologies. A newly manufactured system, although expensive, should be sought so as to take advantage of any warranty. Several vendors were approached so as to determine a range of price, capabilities and performance before proceeding with a purchase.
Keywords
Resistance heated source , Large area target , sputtering , Vacuum deposition
Journal title
Astroparticle Physics
Record number
2028585
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