Title of article
Field ion specimen preparation from near-surface regions
Author/Authors
Larson، نويسنده , , D.J. and Miller، نويسنده , , M.K. and Ulfig، نويسنده , , R.M and Matyi، نويسنده , , R.J and Camus، نويسنده , , P.P and Kelly، نويسنده , , T.F، نويسنده ,
Pages
6
From page
273
To page
278
Abstract
The feasibility of fabricating field ion specimens from planar surfaces by the technique of ion beam mask etching has been demonstrated. The production of an electric field at the tip apex sufficient to produce field evaporation has been accomplished by a combination of the minimization of the surface area, the increase in the tip height above the planar surface, and the minimization of the tip radius and shank angle.
Keywords
Atom probe field ion microscopy , specimen preparation , Ion sputtering
Journal title
Astroparticle Physics
Record number
2046836
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