Title of article
A new process for producing a granular material
Author/Authors
Ishii، نويسنده , , K. and Ohba، نويسنده , , T. and Hara، نويسنده , , T.، نويسنده ,
Pages
3
From page
232
To page
234
Abstract
A new process, based on gas-flow-sputtering technique, was developed for the formation of granular films. The films in which Ni80Fe20 fine particles were embedded were produced by the alternate deposition of Ag vapor and Ni80Fe20 fine particles. The transmission electron microscopy study was carried out to examine the structure of the films. The results revealed that the new process possesses high potential for the production of a new type of granular film.
Keywords
Granular material , Gas-flow-sputtering technique , Transmission electron microscopy
Journal title
Astroparticle Physics
Record number
2050950
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