• Title of article

    Electrochemical evaluation of pinhole defects in TiN films prepared by r.f. reactive sputtering

  • Author/Authors

    Uchida، نويسنده , , Hitoshi and Inoue، نويسنده , , Shozo and Koterazawa، نويسنده , , Keiji، نويسنده ,

  • Pages
    4
  • From page
    649
  • To page
    652
  • Abstract
    TiN films were deposited onto stainless steels by r.f. reactive sputtering and they contained more or less pinhole defects. The area ratio of pinhole defects was evaluated potentiodynamically with the ratio of critical passivation current density of TiN-coated and non-coated specimen in a deaerated 0.5 kmol/m3H2SO4 + 0.05 kmol/m3KSCN solution. The result coincided well with the true defect area ratio based on the optical micrographs before and after polarized anodically. Such electrochemical method was concluded to be a reliable evaluation technique for the pinhole defects of corrosion-resistible coating.
  • Keywords
    polarization curve , Pinhole defect , Titanium nitride , R.f. reactive sputtering
  • Journal title
    Astroparticle Physics
  • Record number

    2052382