Title of article
X-ray residual stress analysis on machined and tempered HPSN-ceramics
Author/Authors
Immelmann، نويسنده , , S and Welle، نويسنده , , E and Reimers، نويسنده , , W، نويسنده ,
Pages
6
From page
287
To page
292
Abstract
The residual stress state induced by grinding and tempering of hot pressed silicon nitride (HPSN) samples is studied by X-ray diffraction. The results reveal that the residual stress values at the surface of the samples as well as their gradient within the penetration depth of the X-rays depend on the sintering aid and thus, on the glassy phase content of the HPSN. Tempering of the ground HPSN reduces the residual stress values due to microplastic deformation, whereas an oxidation of the glassy phase leads to the formation of compressive residual stresses.
Keywords
X-Ray , Residual stress analysis , Tempered HPSN-ceramics
Journal title
Astroparticle Physics
Record number
2052724
Link To Document