Title of article
Non-linear processes in the gas cluster ion beam modification of solid surfaces
Author/Authors
Yamada، نويسنده , , I and Matsuo، نويسنده , , J and Toyoda، نويسنده , , N and Aoki، نويسنده , , T and Jones، نويسنده , , E and Insepov، نويسنده , , Z، نويسنده ,
Pages
9
From page
249
To page
257
Abstract
The unique characteristics of gas cluster ion beam processing are reviewed. Cluster ion beams consisting of hundreds to thousands of atoms have been generated from various kinds of gas materials. Multiple collisions during the impact of accelerated cluster ions upon the substrate surfaces produce fundamentally non-linear bombarding processes. These bombarding characteristics can be applied to shallow ion implantation, high yield sputtering and smoothing, surface cleaning and low temperature thin film formation.
Keywords
Shallow ion implantation , sputtering , Surface smoothing , Cluster ion-assisted thin film deposition , Cluster ion beam
Journal title
Astroparticle Physics
Record number
2053961
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