Title of article
Roughness and oxidation: application to NiO growth on Ni at 800°C
Author/Authors
Huntz، نويسنده , , A.M and Lefevre، نويسنده , , B and Cassino، نويسنده , , F، نويسنده ,
Pages
8
From page
190
To page
197
Abstract
The changes with oxidation time of the oxide outer surface roughness, the oxide grain size and the oxidation rate constant kc for NiO growth on Ni were studied at 800°C in 1 atm oxygen. The roughness was determined by optical interferometry establishing 2D-profiles and 3D-images. Correlations were found between the variations of the oxide outer surface roughness or the kc values and the oxide grain size. These are attributed to the decrease of the oxide grain boundary density with time, which induces a decrease of the effective diffusion coefficient.
Keywords
Oxide grain size , NiO roughness , Nickel oxidation , Oxidation constant
Journal title
Astroparticle Physics
Record number
2056917
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