Title of article
Phase selection in magnetron sputter-deposited TiAl alloy
Author/Authors
Wang، نويسنده , , S.Z. and Shao، نويسنده , , G. and Tsakiropoulos، نويسنده , , P. and Wang، نويسنده , , F.، نويسنده ,
Pages
6
From page
141
To page
146
Abstract
Microstructural evolution in an amorphous Ti–50 at.% Al deposit, which was produced by magnetron sputter deposition, has been studied. At low temperatures the α phase and hence the α2 phase preceded the equilibrium γ phase during isothermal annealing. Phase selection during annealing of the amorphous film is discussed using thermodynamic modelling and nucleation theory.
Keywords
TiAl , Sputter deposition , metallic glass , Devitrification , Phase selection
Journal title
Astroparticle Physics
Record number
2060307
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