Title of article
AFM observation for the change of surface morphology of TPD thin films due to thermal annealing
Author/Authors
Mandai، نويسنده , , Makiko and Takada، نويسنده , , Kenji and Aoki، نويسنده , , Toru and Fujinami، نويسنده , , Tatsuo and Nakanishi، نويسنده , , Yoichiro and Hatanaka، نويسنده , , Yoshinori، نويسنده ,
Issue Information
دوماهنامه با شماره پیاپی سال 1997
Pages
2
From page
123
To page
124
Abstract
The dependence of the surface morphology of triphenyldiamine derivative (TPD) thin films on the deposition rate was observed by atomic force microscopy (AFM). Moreover, electroluminescent (EL) properties as a function of the TPD deposition rate were also measured. It was found that a deposition rate of around 3 إ/s is the optimum for the flatness of the films and EL properties.
Keywords
atomic force microscopy , Triphenyldiamine derivative , Thin films , surface morphology , Thermal annealing , electroluminescence
Journal title
Synthetic Metals
Serial Year
1997
Journal title
Synthetic Metals
Record number
2071627
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