Title of article
Nanostructuring poly-[2-methoxy-5-(2′-ethyl-hexiloxy)-p-phenylenevinylene] thin films by high-temperature soft lithography
Author/Authors
Pisignano، نويسنده , , Dario and Persano، نويسنده , , Luana and Babudri، نويسنده , , Francesco and Farinola، نويسنده , , Gianluca M. and Naso، نويسنده , , Francesco and Cingolani، نويسنده , , Roberto and Gigli، نويسنده , , Giuseppe، نويسنده ,
Issue Information
دوماهنامه با شماره پیاپی سال 2003
Pages
3
From page
679
To page
681
Abstract
Sub micron patterning of the conjugated polymer, poly-[2-methoxy-5-(2′-ethyl-hexiloxy)-p-phenylenevinylene] (MEH-PPV) has been achieved by high-temperature soft lithography. The process has been carried out by placing a spin-coated polymer film in conform
Keywords
patterning , PDMS , glass transition temperature
Journal title
Synthetic Metals
Serial Year
2003
Journal title
Synthetic Metals
Record number
2079546
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