Title of article
Field effect in chemical vapour deposited graphene incorporating a polymeric gate dielectric
Author/Authors
Tan، نويسنده , , Y.Y. and Tan، نويسنده , , L.W. and Jayawardena، نويسنده , , K.D.G.I. and Anguita، نويسنده , , J.V. and Carey، نويسنده , , J.D. and Silva، نويسنده , , S.R.P.، نويسنده ,
Issue Information
دوماهنامه با شماره پیاپی سال 2011
Pages
4
From page
2249
To page
2252
Abstract
We have investigated the room temperature long channel field effect characteristics of a single graphene layer transistor incorporating a poly-4-vinyl-phenol (PVP) organic insulating layer, as an alternative to conventional oxide gate dielectric materials. High purity copper foils were used in the chemical vapour growth of the graphene layer and visible Raman analysis confirmed the presence of a high quality mono-layer carbon film. Using a channel length of 50 μm, a field effect hole mobility of 37 cm2/Vs was calculated, which demonstrates the possibility of an all carbon graphene based large area transistor with carrier mobilities above those found in conventional long channel all organic electronic transistors.
Keywords
chemical vapour deposition , graphene , transistor , Polymeric gate
Journal title
Synthetic Metals
Serial Year
2011
Journal title
Synthetic Metals
Record number
2088339
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