Title of article
Preparation and characterization of single crystals of intercalation compounds CuxTiS2
Author/Authors
Hiroaki Kusawake، نويسنده , , T. and Takahashi، نويسنده , , Y. and Ohshima، نويسنده , , K.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1998
Pages
6
From page
1009
To page
1014
Abstract
Single crystals of intercalation compounds CuxTiS2 were prepared by the electrochemical method with an alternating current (voltage) applied. Structural characteristics of the compounds were investigated by X-ray diffraction method. The concentration of Cu atoms, x, is proportional to the time that the voltage is applied and the maximal value of x was estimated to be 0.7. Mosaic spreads of the intercalation compounds parallel to the c axis have almost the same value (∼0.5 degrees) as that of pure TiS2, using estimates of the full width at half maximum (FWHM) of the (004) X-ray Bragg reflection. The diffraction patterns for all intercalation compounds are the same in that only the stage 1 structure exists. The c-axis lattice constant increases gradually with increase of x and is about 3% larger at x = 0.61 compared with that for pure TiS2.
Keywords
C. X-ray diffraction , A. Layered compounds , B. intercalation reactions , D. Crystal structure , A. Chalcogenides
Journal title
Materials Research Bulletin
Serial Year
1998
Journal title
Materials Research Bulletin
Record number
2094020
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