Title of article
On the optical constants of TiO2 thin films. Ellipsometric studies
Author/Authors
Mardare، نويسنده , , Diana and Stancu، نويسنده , , Alexandru، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
9
From page
2017
To page
2025
Abstract
TiO2 thin films were obtained on unheated glass substrates by a DC reactive magnetron sputtering method. The as-deposited films exhibit an amorphous structure as observed from X-ray diffraction (XRD) patterns. The structure changes to a mixed one of 70% anatase and 30% rutile after heat treatment in air in the temperature range 293–673 K. Using ellipsometric measurements, and a computer to solve the corresponding equations, a modeling technique was used to find the optical constants of the studied thin films. A sensitivity analysis was performed.
Keywords
A. Thin films , A. Oxides , B. Sputtering , C. X-ray diffraction , D. Optical properties
Journal title
Materials Research Bulletin
Serial Year
2000
Journal title
Materials Research Bulletin
Record number
2094977
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