Title of article
A laser-cooled atom beam for nanolithography applications
Author/Authors
Camposeo، نويسنده , , A and Cervelli، نويسنده , , Arnaud Piombini، نويسنده , , F. Tantussi، نويسنده , , F and Fuso، نويسنده , , F and Allegrini، نويسنده , , M and Arimondo، نويسنده , , E، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
4
From page
217
To page
220
Abstract
We are developing an apparatus for atom lithography with the main objective of to push the space resolution of the technique towards its ultimate limit, expected in the 10 nm range. We exploit an original implementation of laser-cooling techniques to produce a brilliant and collimated cesium beam with low longitudinal velocity. Beam characterization, carried out with a variety of spectroscopic techniques, demonstrates the compatibility of the system with the strict requirements of nanolithography experiments.
Keywords
Atom lithography , Nanofabrication , Laser-cooling , Laser manipulation
Journal title
Materials Science and Engineering C
Serial Year
2003
Journal title
Materials Science and Engineering C
Record number
2098021
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