Title of article
HRTEM analysis of the nanostructure of porous silicon
Author/Authors
Martيn-Palma، نويسنده , , R.J. and Pascual، نويسنده , , L. and Landa-Cلnovas، نويسنده , , A.R. and Herrero، نويسنده , , P. and Martيnez-Duart، نويسنده , , J.M.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2006
Pages
5
From page
830
To page
834
Abstract
The nanometric structure of porous silicon makes this material to be very suitable for its use in many different fields, including optoelectronics and biological applications. In the present work, the structure of porous silicon was investigated in detail by means of cross-sectional high-resolution transmission electron microscopy and digital image processing, together with electron energy loss spectroscopy. The structure of the Si/porous silicon interface and that of the silicon nanocrystals that compose porous silicon have been analyzed in detail. A strong strain contrast in the Si/porous silicon interface caused by high stresses was observed. Accordingly, dislocation pairs are found to be a possible mechanism of lattice matching between porous silicon and the Si substrate. Finally, high relative concentration of oxygen in the porous silicon layer was observed, together with low relative electron concentration in the conduction band when compared to Si.
Keywords
Si interface , Dislocations , Porous silicon , HRTEM , Nanostructure , EFTEM
Journal title
Materials Science and Engineering C
Serial Year
2006
Journal title
Materials Science and Engineering C
Record number
2098845
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