Title of article
Charge defects-induced electrical properties in bismuth ferrite bilayered thin films
Author/Authors
Wu، نويسنده , , Jiagang and Zhang، نويسنده , , Binyu and Wang، نويسنده , , Xiaopeng and Wang، نويسنده , , John Z. Zhu، نويسنده , , Jianguo and Xiao، نويسنده , , Dingquan، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2013
Pages
5
From page
2973
To page
2977
Abstract
Effects of charge defects on electrical properties of BiFeO3/Bi0.90La0.10Fe0.85Zn0.15O3 (BFO/BLFZO) bilayered thin films are investigated, and the concentration of charge defects is controlled by changing their deposition temperatures during sputtering. It is of great interest to note that these bilayers endure an orientation transition from (1 0 0) to (1 1 0) with increasing deposition temperatures. An enhanced dielectric, ferroelectric, and fatigue behavior has been demonstrated in these bilayers deposited at an optimum growth window. A better electrical behavior of 2Pr ~ 138.2 μC/cm2, 2Ec ~ 657.3 kV/cm, εr ~ 189, and tan δ ~ 2.72% has been demonstrated in BFO/BLFZO bilayers, and the underlying physical mechanism is also addressed.
Keywords
A. Thin films , D. Electrical properties , B. Sputtering , A. Multilayer
Journal title
Materials Research Bulletin
Serial Year
2013
Journal title
Materials Research Bulletin
Record number
2103887
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