Title of article
Field ion microscopy observation of intrinsic stacking faults in iridium
Author/Authors
Song، نويسنده , , S.G. and Chen، نويسنده , , C.L. and Tsong، نويسنده , , T.T.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1996
Pages
4
From page
119
To page
122
Abstract
An intrinsic stacking fault in Ir is characterized using FIM techniques. Lattice distortion in the vicinity of the partial dislocation loop bounding the fault is evaluated. The maximum radius of visible distortion in the vicinity of the partial dislocation is found to be ∼4.6 nm. This result provides experimental data for the assessment of the magnitude of lattice disturbance caused by crystal defects, which can be useful in the computer modeling of crystal defects.
Keywords
iridium , Field ion microscopy , Intrinsic stacking fault
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Serial Year
1996
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Record number
2132203
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