Title of article
The effect of substrate temperatures on the Hall coefficient of α-Mn thin films
Author/Authors
Boakye، نويسنده , , F. and Adanu، نويسنده , , K.G. and Grassie، نويسنده , , A.D.C.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1997
Pages
5
From page
50
To page
54
Abstract
Hall coefficient measurements in evaporated α-Mn thin films have been carried out in magnetic fields up to 63 kG in the temperature range between 1.5 and 100 K using the van der Pauw four probe technique. The results show a range of temperature variation of the Hall coefficient (RH) depending upon the substrate temperatures used. At high substrate temperatures (Ts > 100 °C) and in high vacuum the sign of RH changes from negative to positive as the temperature is lowered from 100 to 1.5 K, whilst at low substrate temperatures (Ts 30 °C) and in a similar vacuum the sign of RH remains negative. The results of the Hall coefficient in the films are analysed using the two band model of conduction with temperature independent carrier concentrations.
Keywords
Hall coefficient , Substrate temperatures , Thin films
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
1997
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2132286
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