Title of article
Hydrogen-related effects in GaInP/GaAs HBTs: incorporation, removal and influence on device reliability
Author/Authors
Cassette، نويسنده , , S. and Delage، نويسنده , , S.L. and Chartier، نويسنده , , E. and Floriot، نويسنده , , D. and Poisson، نويسنده , , M.A. and Garcia، نويسنده , , J.C. and Grattepain، نويسنده , , C. and Mimila Arroyo، نويسنده , , J. and Plana، نويسنده , , Mary R. and Bland، نويسنده , , S.W.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
5
From page
279
To page
283
Abstract
We report the result of investigation on hydrogen effects on GaInP/GaAs HBT structures originating from different MOCVD and CBE suppliers. It is demonstrated that hydrogen gives rise to initial unstable electrical behaviour by cross-examination of samples with and without hydrogen either intrinsically or by thermal-assisted removal. Annealing conditions to remove hydrogen have been optimized on the basis of SIMS analyses and Gummel plot characteristics to control eventual degradation of the junctions. It has been found that under particular doping and growth conditions, C2H complexes can be formed. These defects appear more stable than CH complexes which may explain the difficulty to remove hydrogen from some epitaxial layers.
Keywords
GaInP/GaAs HBT structures , Carbon doping , Hydrogen-related effects
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
2001
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2136634
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